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Diamond Lapping and Polishing

DIAMOND SUBSTRATE PROCESSING

Lapping / Polishing / CMP / PMP

DIAMOND SUBSTRATE LAPPING, POLISHING & CMP/PMP SERVICES
Ultimate Flatness for the Final Mile of Diamond Applications

Diamond has the highest natural hardness (Mohs hardness 10). This is both its greatest advantage and its greatest processing challenge.

We specialize in precision diamond substrate lapping and polishing contract services, helping customers process CVD or HPHT-grown diamond substrates to specifications ready for direct use in downstream applications such as semiconductors, optoelectronics, and quantum devices—without the need to invest in expensive in-house diamond precision processing equipment.

鑽石基板不同加工狀態比較
Comparison of Diamond Substrate Processing Conditions and Surface Quality
PRECISION PROCESSING

Our Core Processing Capabilities

01

Rough Grinding Grinding / Lapping

  • Removes the rough surface structure and thickness variations of as-grown diamond, while adjusting the substrate’s initial thickness and flatness
鑽石基板 Rough 粗加工狀態
Rough|粗加工
鑽石基板 Grinding 研磨加工
Grinding|研磨
02

Fine Polishing Polishing

鑽石基板 Polishing 精密拋光
Polishing|Precision Polishing
  • Uses mechanical polishing, laser polishing, and other techniques to reduce surface roughness to the sub-nanometer level while eliminating subsurface damage, ensuring that subsequent thin-film deposition and device performance are not affected
03

Chemical Mechanical Planarization CMP|Chemical Mechanical Planarization

  • Combines chemical etching and mechanical polishing to achieve wafer-level flatness and low defect density, meeting the most stringent substrate flatness requirements of semiconductor and quantum devices
鑽石基板 CMP 化學機械平坦化
CMP|Chemical Mechanical Planarization
04

Plasma-Assisted Mechanical Polishing PMP|Plasma-Assisted Mechanical Polishing

  • First uses plasma treatment to weaken the bonds on the diamond surface, then combines it with mechanical polishing to significantly improve processing efficiency and reduce subsurface damage, overcoming the efficiency limitations of conventional mechanical polishing for ultra-hard materials

VALUE ADDED SERVICES

Value-Added Services

Customized dimensions and thickness specifications
Surface roughness control, down to the sub-nanometer level
Precision control of parallelism and warpage
High-volume production capacity and batch-to-batch consistency management
Substrate inspection services, including thermal conductivity measurement and defect inspection
APPLICATIONS

Applications

Semiconductor packaging and wafer-level substrate processing
Heat-spreading substrates for high-power laser diodes
Substrates for quantum devices and sensors
Substrates for optical windows and microwave components
WHY CHOOSE US

Why Choose Us

From rough grinding to precision CMP/PMP polishing, we provide one-stop contract diamond substrate surface processing services, allowing customers to focus on their own product development without taking on the substantial investment and technical barriers associated with precision diamond processing equipment. Whether for single-crystal or polycrystalline diamond substrates, we provide surface quality solutions tailored to specific application requirements.

CONTACT US

Contact us to learn more about diamond substrate lapping, polishing, CMP, PMP, and customized contract processing services.

Discuss Your Customized Solution