SUBSTRATE FOR DEVICE(DIAMOND WAFER)
Mono Crystal Substrate
〈Basic Spec.〉
Impurity: Nitrogen<10ppm、B and Si<SIMS resolution
Orientation: (100) having off angle around 3 degree
Polishing: Regular roughness Ra<50nm, Fine polishing Ra<10nm
Size: 1x1 to 10x10mm, Thickness, 0.5-2mm
〈Special Spec.〉
Orientation: (110) and (111)
Off angle: Between 0 to 5 degree selected toward plane
Low FWHM of X-ray locking curve, smaller than 40 or 50arcsec
〈High quality crystal〉
Low FWHM of X-ray locking curve, smaller than 40 or 50arcsec