SUBSTRATE FOR DEVICE(DIAMOND WAFER)

Mono Crystal Substrate

Basic Spec.

Impurity: Nitrogen<10ppm、B and Si<SIMS resolution

Orientation: (100) having off angle around 3 degree

Polishing: Regular roughness Ra<50nm, Fine polishing Ra<10nm

Size: 1x1 to 10x10mm, Thickness, 0.5-2mm

 

Special Spec.

Orientation: (110) and (111)

Off angle: Between 0 to 5 degree selected toward plane

Low FWHM of X-ray locking curve, smaller than 40 or 50arcsec

High quality crystal

Low FWHM of X-ray locking curve, smaller than 40 or 50arcsec